Nano-lithography with atoms

The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithography is presented. The methods and results from vario...

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Bibliographic Details
Published in:Surface science 1999-08, Vol.433, p.40-47
Main Authors: Bell, A.S, Brezger, B, Drodofsky, U, Nowak, S, Pfau, T, Stuhler, J, Schulze, Th, Mlynek, J
Format: Article
Language:English
Subjects:
Alkali metals
Atomic force microscopy
Chromium
Growth
Noble gases
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Summary:The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithography is presented. The methods and results from various groups are discussed. A more in-depth study of three different types of atom lithography undertaken in our group is given.
ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(99)00083-7