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Magnetoresistant La1-xSrxMnO3 films by pulsed injection metal organic chemical vapor deposition: effect of deposition conditions, substrate material and film thickness

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Bibliographic Details
Published in:	Thin solid films 2002-06, Vol.413 (1-2), p.32-40
Main Authors:	ABRUTIS, A, PLAUSINAITIENE, V, KUBILIUS, V, TEISERSKIS, A, SALTYTE, Z, BUTKUTE, R, SENATEUR, J. P
Format:	Article
Language:	English
Subjects:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Colossal magnetoresistance Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electrical properties of specific thin films Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Magnetic properties and materials Magnetic properties of monolayers and thin films Magnetic properties of surface, thin films and multilayers Magnetotransport phenomena, materials for magnetotransport Materials science Methods of deposition of films and coatings film growth and epitaxy Other inorganic semiconductors Physics
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