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Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates

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Bibliographic Details
Published in:Thin solid films 2002-06, Vol.413 (1-2), p.186-197
Main Authors: GRONER, M. D, ELAM, J. W, FABREGUETTE, Eh, GEORGE, S. M
Format: Article
Language:English
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ISSN:0040-6090
1879-2731
DOI:10.1016/s0040-6090(02)00438-8