Transparent-conductive indium tin oxide films fabricated by atmospheric r.f. plasma deposition technique

We report new results on indium tin oxide (ITO) films fabricated on a soda lime silicate (SLS) glass by an atmospheric r.f. plasma mist deposition process. The ITO films and powders were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and infrared spectroscopy. As-deposited fil...

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Bibliographic Details
Published in:Thin solid films 1996-12, Vol.290, p.6-9
Main Authors: Lee, D.H., Moss, R.W., Vuong, K.D., Dietrich, M., Condrate, R.A., Wang, X.W.
Format: Article
Language:English
Subjects:
Conductivity
Infrared spectroscopy
Plasma processing and deposition
X-ray diffraction
X-ray photoelectron spectroscopy
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Summary:We report new results on indium tin oxide (ITO) films fabricated on a soda lime silicate (SLS) glass by an atmospheric r.f. plasma mist deposition process. The ITO films and powders were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and infrared spectroscopy. As-deposited films are uniform, transparent, and conductive. Phase formation, lattice parameters, and binding energies depend on the indium-to-tin ratio. When the tin concentration is low, the resultant phase is a cubic indium oxide. As the tin concentration increases from 0% to 40%, the cubic lattice parameter increases. When the indium concentration is low, the resultant phase is a tetragonal tin oxide. As the indium concentration increases from 0% to 20%, the tetragonal lattice parameters increase, while the tin binding energies decrease slightly.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(96)09063-3