Growth of Fe3N films via chemical vapor deposition of iron acetylacetonate and anhydrous ammonia

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Bibliographic Details
Published in:Thin solid films 1998-08, Vol.326 (1-2), p.47-50
Main Authors: ROBERSON, S. L, FINELLO, D, BANKS, A. D, DAVIS, R. F
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(98)00571-9