Effects of deposition parameters on the crystallinity of CeO2 thin films deposited on Si(100) substrates by r.f.-magnetron sputtering

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Bibliographic Details
Published in:Thin solid films 2000-02, Vol.360 (1-2), p.154-158
Main Authors: KIM, L, KIM, J, JUNG, D, PARK, C.-Y, YANG, C.-W, ROH, Y
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
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ISSN:0040-6090
1879-2731
DOI:10.1016/s0040-6090(99)01087-1