Remote-coupled sensing of plasma harmonics and process end-point detection

A remote-coupled dual-directional coupler used in the single-directional mode for process harmonic end-point detection is described. Harmonic end-point detection of photoresist stripping and chamber cleaning of silicon dioxide is demonstrated in three different plasma tools for two plasma chemistrie...

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Bibliographic Details
Published in:Vacuum 2000-06, Vol.57 (4), p.351-364
Main Authors: Law, V.J, Kenyon, A.J, Thornhill, N.F, Srigengan, V, Batty, I
Format: Article
Language:English
Subjects:
Electrical and electronic components, instruments and techniques
Electron collisions
Elementary processes in plasma
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma diagnostic techniques and instrumentation
Plasma properties
Radio-frequency and microwave measurements
Transport properties
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Summary:A remote-coupled dual-directional coupler used in the single-directional mode for process harmonic end-point detection is described. Harmonic end-point detection of photoresist stripping and chamber cleaning of silicon dioxide is demonstrated in three different plasma tools for two plasma chemistries (pure O 2 and 10% O 2 in CF 4, respectively). The responding harmonic number is found to be determined by the frequency response of the plasma tool, whereas the harmonic amplitude response is proportional to the volume of injected etched material, either from a wafer surface or chamber wall. The technique described uses a non-invasive remote-coupled probe which can be employed without re-engineering the plasma tool.
ISSN:0042-207X
1879-2715
DOI:10.1016/S0042-207X(00)00229-3