rf discharge plasma conditions in a plasma processing apparatus

Measurements were made of specimen support, wall and probe potentials in a plasma, as typically used for plasma enhanced reactions, excited by an rf supply (27 MHz, 80 V peak to peak). The rf power was coupled to the reaction chamber with various electrode arrangements. The results show that the spe...

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Bibliographic Details
Published in:Vacuum 1977, Vol.27 (2), p.65-67
Main Author: Ojha, S.M.
Format: Article
Language:English
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Summary:Measurements were made of specimen support, wall and probe potentials in a plasma, as typically used for plasma enhanced reactions, excited by an rf supply (27 MHz, 80 V peak to peak). The rf power was coupled to the reaction chamber with various electrode arrangements. The results show that the specimen support and metal strips placed along the chamber wall develop a potential which is always negative with respect to plasma potential, but positive or negative to ground depending on various types of rf electrode arrangement. Electron and ion currents were found to diminish when a floating metal screen insulated from ground was placed around the specimen support. However when the metal screen was grounded the ion current at the support decreased but electron current, in general, increased. Double probe measurements were made to estimate electron energy in an rf discharge.
ISSN:0042-207X
1879-2715
DOI:10.1016/S0042-207X(77)80765-3