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Numerical simulation of plasma flow downstream in an ECR plasma deposition apparatus

The plasma flow along the divergent magnetic field of an electron cyclotron resonance (ECR) plasma source has been simulated. We assume that ions undergo charge exchange and elastic scattering collisions with the neutral gas in the downstream region. An iterative scheme for solution of the Boltzmann...

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Bibliographic Details
Published in:Vacuum 1999-03, Vol.52 (3), p.219-223
Main Authors: Ning, Z.Y., Guo, S.Y., Cheng, S.H.
Format: Article
Language:English
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Summary:The plasma flow along the divergent magnetic field of an electron cyclotron resonance (ECR) plasma source has been simulated. We assume that ions undergo charge exchange and elastic scattering collisions with the neutral gas in the downstream region. An iterative scheme for solution of the Boltzmann equation and quasineutrality has been developed, based on a Monte Carlo description for ion dynamics and reasonable data in our experimental device. We studied the effects of the magnetic field configuration and neutral gas pressure on the plasma potential, density distribution along a divergent magnetic field, and the ion flux density and energy incident on a substrate. The numerical simulated results have been compared with the experimental data measured by using Langmuir probe in our ECR plasma chemical vapor deposition system.
ISSN:0042-207X
1879-2715
DOI:10.1016/S0042-207X(97)00083-3