Analysis of sub-wavelength sized OPC features

Rigorous 3-D electromagnetic analysis is used to examine the actual near field characteristics and assess the resulting effects on imaging of light passing through serifs and hammer head line-ends in optical proximity correction (OPC) of photomasks. The simulation is carried out using the finite-dif...

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Bibliographic Details
Published in:Microelectronic engineering 1998-03, Vol.41, p.137-140
Main Authors: Adam, K., Neureuther, A.R., Socha, R., Pistor, T.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:Rigorous 3-D electromagnetic analysis is used to examine the actual near field characteristics and assess the resulting effects on imaging of light passing through serifs and hammer head line-ends in optical proximity correction (OPC) of photomasks. The simulation is carried out using the finite-difference time-domain simulator TEMPEST using up to 5 million nodes and 150M of memory. OPC features which are contiguous and share sides with open features transmit very effectively, whereas OPC features which are isolated by chrome stringers or are cut-off by nearly touching chrome corners are much less effective and require rigorous electromagnetic analysis.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(98)00030-6