Fabrication of microelectron gun arrays using laser micromachining

We have successfully fabricated miniaturized field emission tip arrays with microcolumns using microfabrication technology and laser micromachining. The nanosize Si-tip arrays with 20nm radii were fabricated using conventional microfabrication techniques such as an isotropic reactive ion etching(RIE...

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Bibliographic Details
Published in:Microelectronic engineering 1998-03, Vol.41, p.167-170
Main Authors: Choi, Seong.S., Jung, M.Y., Kim, D.W., Yakshin, M.A., Park, J.Y., Kuk, Y.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Vacuum microelectronics
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Summary:We have successfully fabricated miniaturized field emission tip arrays with microcolumns using microfabrication technology and laser micromachining. The nanosize Si-tip arrays with 20nm radii were fabricated using conventional microfabrication techniques such as an isotropic reactive ion etching(RIE), a sharpening oxidation procedure, etc. The microcolumns were fabricated using laser micromachining techniques. Preparatory laser micromachining has been performed on the various materials such as Si wafer, Mo, Ta and 304 stainless steel. Various holes with radii ranging from 2 to 100 micron on these materials were successfully fabricated using TEM 00 Yag:Nd 3+ laser. The patterns of electron beams through the laser-fabricated microcolumns were observed using a micro channel plate and a charge coupled device (CCD) camera.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(98)00037-9