Generation of large area condenser zone plates with smallest zone width below 40 nm by electron beam lithography

The generation of electron beam generated condenser zone plates for high resolution X-ray microscopy is described. The smallest zone width is reduced to below 40 nm compared to interferomatically generated condensers with smallest zone width of 54 nm. This results in higher numerical aperture of the...

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Bibliographic Details
Published in:Microelectronic engineering 1998-03, Vol.41, p.465-468
Main Author: Schliebe, T.
Format: Article
Language:English
Subjects:
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
X- and γ-ray instruments and techniques
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Description
Summary:The generation of electron beam generated condenser zone plates for high resolution X-ray microscopy is described. The smallest zone width is reduced to below 40 nm compared to interferomatically generated condensers with smallest zone width of 54 nm. This results in higher numerical aperture of the condenser zone and thus the imaging properties of the X-ray microscope near the resolution limit are improved. The suitability of the Lithography system LION LV1 for the generation of large area diffractive X-ray optics is demonstrated.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(98)00108-7