Atomic lithography

Neutral atoms have been used to write two dimensional structures on silicon substrates. Two different methods have been used. In one experiment chromium atoms were deposited directly using standing wave light masks. In a second experiment, a self-assembling monolayer was used as a resist for metasta...

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Bibliographic Details
Published in:Microelectronic engineering 1998-03, Vol.41, p.587-590
Main Authors: Bell, A.S., Pfau, T., Drodofsky, U., Stuhler, J., Schulze, Th, Brezger, B., Nowak, S., Mlynek, J.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:Neutral atoms have been used to write two dimensional structures on silicon substrates. Two different methods have been used. In one experiment chromium atoms were deposited directly using standing wave light masks. In a second experiment, a self-assembling monolayer was used as a resist for metastable helium atoms in a proximity printing experiment.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(98)00138-5