On the growth mechanism of UV laser deposited a-C:H from CH2I2 at room temperature

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Bibliographic Details
Published in:Applied surface science 2001-03, Vol.172 (3-4), p.200-206
Main Authors: LINDSTAM, Mikael, BOMAN, Mats, PIGLMAYER, Klaus
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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ISSN:0169-4332
1873-5584
DOI:10.1016/s0169-4332(00)00853-9