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Time-of-flight-SIMS and XPS characterization of metal doped polymers

Organic thin films with defined chemical structures and physical properties are required for various applications. Plasma polymerization is of technological interest, since the deposition of plasma polymers is possible on any material of any shape in the desired thickness. We report on the TOF-SIMS...

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Bibliographic Details
Published in:Applied surface science 2003-01, Vol.203, p.575-579
Main Authors: Gross, Th, Retzko, I., Friedrich, J., Unger, W.
Format: Article
Language:English
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Summary:Organic thin films with defined chemical structures and physical properties are required for various applications. Plasma polymerization is of technological interest, since the deposition of plasma polymers is possible on any material of any shape in the desired thickness. We report on the TOF-SIMS (TOF: time-of-flight) and XPS investigations of pulse plasma ‘poly(acetylene)’ and alkali metal doped pulse plasma ‘poly(acetylene)’ films. The combination of TOF-SIMS and XPS supplies detailed information on the surface chemistry of these films. Application of both methods provides the possibility for cross-checking certain results. Moreover the different sensitivities of the methods can be utilized. According to the TOF-SIMS and XPS data it can be concluded that the interaction of alkali metals with plasma ‘poly(acetylene)’ results in electrovalent bonds of the type Me δ+ –C δ− between carbon and metal. Furthermore carbon–oxygen–metal interactions were observed. These interactions are of the type CO δ− ⋯Me δ+ and/or C–O δ− –Me δ+ .
ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(02)00769-9