On the reliability of SIMS depth profiles through HfO2-stacks

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Bibliographic Details
Main Authors: VANDERVORST, W, BENNETT, J, HUYGHEBAERT, C, CONARD, T, GONDRAN, C, DE WITTE, H
Format: Conference Proceeding
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Physics
Online Access:Get full text
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ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(04)00342-3