A low temperature system with a pulse UV laser for scribing HTSC films and single crystals

A simple laser scribing equipment used to pattern high- T c films and single crystals within a micron accuracy is described. A focused beam of a UV pulsed laser serves as a cutting tool. A low temperature attachment enables all operations to be performed at sample temperatures ranging from 65 to 300...

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Bibliographic Details
Published in:Applied surface science 1996-10, Vol.106, p.321-325
Main Authors: Zhuravel, A.P., Sivakov, A.G., Turutanov, O.G., Dmitrenko, I.M.
Format: Article
Language:English
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:A simple laser scribing equipment used to pattern high- T c films and single crystals within a micron accuracy is described. A focused beam of a UV pulsed laser serves as a cutting tool. A low temperature attachment enables all operations to be performed at sample temperatures ranging from 65 to 300 K. Thus it provides a means to fit the critical current of any element in a cryoelectronic circuit to a desirable value during its operational conditions.
ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(96)00411-4