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Perovskite lead titanate PLD thin films: study of oxygen incorporation by [formula omitted] tracing technique

PbTiO 3 (PT) films have been deposited by pulsed laser deposition (PLD) technique on polycrystalline platinum substrate kept at a constant temperature of 550°C in a 30 Pa 18 O atmosphere pressure. The fluence and the laser repetition (frequency quadrupled Nd-YAG, 266 nm) have been varied in the rang...

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Bibliographic Details
Published in:Materials chemistry and physics 1999-05, Vol.59 (2), p.114-119
Main Authors: Chaoui, N, Millon, E, Muller, J.F, Ecker, P, Bieck, W, Migeon, H.N
Format: Article
Language:English
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Summary:PbTiO 3 (PT) films have been deposited by pulsed laser deposition (PLD) technique on polycrystalline platinum substrate kept at a constant temperature of 550°C in a 30 Pa 18 O atmosphere pressure. The fluence and the laser repetition (frequency quadrupled Nd-YAG, 266 nm) have been varied in the range 1.5-3 J cm −2 and 2-10 Hz, respectively. The obtained films exhibit a perovskite structure and have been analyzed by dynamic secondary ion mass spectrometry (D-SIMS) in order to determine the concentration profiles of 16 O (coming from the PbTiO 3 target) and 18 O (ambient gas). The effects of different parameters of the PLD process are discussed, such as the cooling step of the film in oxygen atmosphere after deposition, the laser repetition rate and the gas phase reactions.
ISSN:0254-0584
1879-3312
DOI:10.1016/S0254-0584(99)00051-6