Diamond-like carbon films prepared by filtered arc deposition for electron field emission application

In this paper, hydrogen-free diamond-like carbon (DLC) films were prepared by filtered arc deposition. The effect of sp 3 content and annealing on electron field emission properties of the DLC films was studied. A patterned DLC flat thin film column emitter array was fabricated by oxygen reactive io...

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Bibliographic Details
Published in:Surface & coatings technology 2001, Vol.137 (1), p.1-5
Main Authors: Mao, D.S., Li, W., Wang, X., Liu, X.H.
Format: Article
Language:English
Subjects:
Applied sciences
Diamond-like carbon
Electron field emission
Electronics
Exact sciences and technology
Filtered arc deposition
Microelectronic fabrication (materials and surfaces technology)
Reactive ion beam etching
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:In this paper, hydrogen-free diamond-like carbon (DLC) films were prepared by filtered arc deposition. The effect of sp 3 content and annealing on electron field emission properties of the DLC films was studied. A patterned DLC flat thin film column emitter array was fabricated by oxygen reactive ion beam etching (RIBE) technique. It was shown that the threshold field of the DLC films was approximately 3–15 V/μm. Field emission site density ranged from 5×10 2 to 2×10 3 /cm 2. The field emission mechanism of the DLC films is also discussed.
ISSN:0257-8972
1879-3347
DOI:10.1016/S0257-8972(00)01078-1