Positive pulse bias method for a high-throughput PBII processing system

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Bibliographic Details
Main Authors: IKEHATA, T, SHIOYA, K, SATO, N. Y, YUKIMURA, K
Format: Conference Proceeding
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Metals. Metallurgy
Production techniques
Surface treatment
Online Access:Get full text
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ISSN:0257-8972
1879-3347
DOI:10.1016/S0257-8972(04)00270-1