Preparation and characterization of V—N films deposited by reactive triode magnetron sputtering

• Published in: Surface & coatings technology 1992, Vol.54, p.115-120
• Main Authors: Farges, G., Beauprez, E., Degout, D.
• Format: Article
• Language: English
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/S0257-8972(09)90037-8

V—N coatings were produced by high current density triode magnetron sputtering in the reactive mode. The influence of basic deposition parameters, mainly nitrogen partial pressure, on the composition, crystal structure and hardness of the V—N films were investigated using electron probe microanalysis, X-ray diffraction and Vickers microhardness testing. The film deposition rate was measured by means of optical emission spectroscopy and a quartz film thickness monitor. The β-V 2N x phase was obtained for x in the range 0.38–0.50. The δ-VN x phase was identified for coatings containing 42.2–49 at.% N. The texture of δ5-VN x coatings changed from a strong preferential orientation to mixed and and finally to for nitrogen-rich coatings. The highest Vickers microhardness, 3600 HV 0.1, was measured for coatings containing in the range 33.3–42.2 at.% N.