Improved design of inverted magnetrons used for deposition of thin films on wires

The inverted type of cylindrical magnetron sputtering has not been widely used, although this system is useful for only certain types of applications such as fibre coatings. This paper presents two types of electrode configurations which improved the complicancy of target assembly by using positive...

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Bibliographic Details
Published in:Surface & coatings technology 1997-04, Vol.90 (3), p.268-274
Main Authors: Kaneko, Tadao, Nittono, Osamu
Format: Article
Language:English
Subjects:
Applied sciences
Deposition
Exact sciences and technology
Inverted magnetrons
Metallic coatings
Metals. Metallurgy
Production techniques
Surface treatment
Thin films
Wires
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Summary:The inverted type of cylindrical magnetron sputtering has not been widely used, although this system is useful for only certain types of applications such as fibre coatings. This paper presents two types of electrode configurations which improved the complicancy of target assembly by using positive voltage power supply. One is a simple type which has no endplate (type I), and the other is a modified type which has a target constructed with a large cylindrical part, a conical part and a small cylindrical part (type II). When positive voltage was applied to an anode for both types, a stable glow discharge was established and a high deposition rate was obtained. The substrate bias current was monitored to estimate the effect of ion bombardment. As a result, it was found that the substrate current was larger in type II than in type I. Microstructure and morphology of titanium films deposited on thin wires were investigated by scanning electron microscopy in relation to preparation conditions. High level ion bombardment was found to be effective in obtaiing a good adhesion for wire coatings.
ISSN:0257-8972
1879-3347
DOI:10.1016/S0257-8972(96)03151-9