XPS investigation of AlN formation in aluminum alloys using plasma source ion implantation

Aluminum alloys AlMgSi1 and AlSi7 have been implanted with nitrogen ions by means of the plasma immmersion ion implantation technique. The samples have been characterized by X-ray photoelectron spectroscopy. Al 2 p and N 1 s signals could be separated into sub-peaks, corresponding to differently bou...

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Bibliographic Details
Published in:Surface & coatings technology 1998-05, Vol.103, p.222-226
Main Authors: Schoser, S, Bräuchle, G, Forget, J, Kohlhof, K, Weber, T, Voigt, J, Rauschenbach, B
Format: Article
Language:English
Subjects:
Aluminum alloys
Nitrogen implantation
Plasma immersion ion implantation (PIII)
X-ray photoelectron spectroscopy (XPS)
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Summary:Aluminum alloys AlMgSi1 and AlSi7 have been implanted with nitrogen ions by means of the plasma immmersion ion implantation technique. The samples have been characterized by X-ray photoelectron spectroscopy. Al 2 p and N 1 s signals could be separated into sub-peaks, corresponding to differently bound states, dependent on the depth below the sample surface and the oxygen concentration. AlN was formed in all implanted samples. An enhancement of the oxygen signal arose in the range between the AlN and metallic aluminum signals. The alloying elements magnesium and silicon showed a strong radiation-enhanced effect of segregation.
ISSN:0257-8972
1879-3347
DOI:10.1016/S0257-8972(98)00397-1