Chemical microanalysis by selected-area ESCA using an electron energy filter in a photoemission microscope

• Published in: Journal of electron spectroscopy and related phenomena 1998-03, Vol.88, p.1009-1014
• Main Authors: Schmidt, O., Ziethen, Ch, Fecher, G.H., Merkel, M., Escher, M., Menke, D., Kleineberg, U., Heinzmann, U., Scho¨nhense, G.
• Format: Article
• Language: English
• ISSN: 0368-2048; 1873-2526
• DOI: 10.1016/S0368-2048(97)00279-X

We present a new and simple device for microspectroscopy being independent of the mode of electron-excitation. Micro-X-ray photoelectron spectroscopy, electron-induced Auger-spectroscopy, as well as local energy-loss spectroscopy were used to investigate metal-adsorption on silicon. This new approach employs a non-imaging electron energy analyser attached to a new-generation photoemission electron microscope with integral microarea selector. Photoelectron microspectroscopy was performed using the direct beam of an undulator (U2 at BESSY) being monochromatised and focused by means of multilayer optics at hv = 95 eV. Similarly, local Auger-electron and EELS spectra have been taken using a simple electron gun for the excitation. The chemical compositions of inhomogenities in thin layers of indium on silicon and the local state of oxidation of a structured Pt Co multilayer have been determined.