Thin carbon film deposition using energetic ions of a dense plasma focus

We report the first ever application of the dense plasma focus (DPF) device for thin film deposition. Thin films of carbon have been deposited on glass, silicon and quartz substrates by ablation of the graphite target using highly energetic argon ions of DPF. These films have been analysed for their...

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Bibliographic Details
Published in:Physics letters. A 1997-02, Vol.226 (3), p.212-216
Main Authors: Kant, Chhaya R., Srivastava, M.P., Rawat, R.S.
Format: Article
Language:English
Subjects:
Carbon
Dense plasma focus
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Summary:We report the first ever application of the dense plasma focus (DPF) device for thin film deposition. Thin films of carbon have been deposited on glass, silicon and quartz substrates by ablation of the graphite target using highly energetic argon ions of DPF. These films have been analysed for their surface profiles, structure and chemical composition using a surface profilometer, X-ray diffractometer (XRD), Raman spectrometer, and electron spectroscopic composition analyser (ESCA), respectively.
ISSN:0375-9601
1873-2429
DOI:10.1016/S0375-9601(96)00916-4