A silicon vibration sensor for tool state monitoring working in the high acceleration range

• Published in: Sensors and actuators. A, Physical Physical, 2000-08, Vol.85 (1), p.194-201
• Main Authors: Thomas, J., Kühnhold, R., Schnupp, R., Ryssel, H.
• Format: Article
• Language: English
• Subjects: Anisotropic etching; Exact sciences and technology; General equipment and techniques; Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Mechanical instruments, equipment and techniques; Physics; Piezoresistive detection; Polysilicon; Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing; Tool state monitoring; Vibration isolation; Vibration sensor
• ISSN: 0924-4247; 1873-3069
• DOI: 10.1016/S0924-4247(00)00379-4

The development, production, and characterization of a miniaturized silicon vibration sensor for an application in tool state monitoring is presented. The high acceleration amplitude and the possibility of a temperature rise during operation require a piezoresistive vibration detection with polycrystalline resistors. The sensor is fabricated by a CMOS compatible process with an additional anisotropic etching. The characterization of the vibration sensor regarding the physical, electrical, and mechanical properties is described. A sensitivity of 29 μV/V g and a resonance frequency of 6.7 kHz could be attained. This represents the highest sensitivity known for this working range and makes the vibration sensor a powerful instrument for detecting vibrations in the high acceleration area.