Microfabrication of Pt-tip microelectrodes

This paper describes the realization of Pt-tip microelectrodes by using microfabrication technology. The total height of these microelectrodes is 47 μm, of which the upper 20 or 2 μm, respectively, are exposed Pt tips with a curvature of 0.5 μm. In order to verify the tip opening, an electrochemical...

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Bibliographic Details
Published in:Sensors and actuators. B, Chemical Chemical, 2000-11, Vol.70 (1), p.51-56
Main Authors: Thiébaud, P, Beuret, C, de Rooij, N.F, Koudelka-Hep, M
Format: Article
Language:English
Subjects:
Microfabrication technology
Pt-tip microelectrodes
Si anisotropic etching
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Summary:This paper describes the realization of Pt-tip microelectrodes by using microfabrication technology. The total height of these microelectrodes is 47 μm, of which the upper 20 or 2 μm, respectively, are exposed Pt tips with a curvature of 0.5 μm. In order to verify the tip opening, an electrochemical plating of thin-film Pt was used. This improves the visualisation of the tips in an SEM and allows us to ascertain the absence of any residual layer. The manufacturing process was assessed by SEM imaging and, in the case of large Pt-tip electrodes, also by an electrochemical evaluation.
ISSN:0925-4005
1873-3077
DOI:10.1016/S0925-4005(00)00553-0