Rare earth-doped alumina thin films deposited by liquid source CVD processes

Two types of liquid-source CVD processes are proposed for the growth of rare earth-doped alumina thin films suitable as amplifying media for integrated optic applications. Amorphous, transparent, pure and erbium- or neodymium-doped alumina films were deposited between 573 and 833 K by atmospheric pr...

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Bibliographic Details
Published in:Journal of alloys and compounds 1998-07, Vol.275-277, p.742-745
Main Authors: Deschanvres, J.L, Meffre, W, Joubert, J.C, Senateur, J.P, Robaut, F, Broquin, J.E, Rimet, R
Format: Article
Language:English
Subjects:
Alumina
CVD
Integrated optics
Rare earth
Thin films
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Summary:Two types of liquid-source CVD processes are proposed for the growth of rare earth-doped alumina thin films suitable as amplifying media for integrated optic applications. Amorphous, transparent, pure and erbium- or neodymium-doped alumina films were deposited between 573 and 833 K by atmospheric pressure aerosol CVD. The rare earth doping concentration increases by decreasing the deposition temperature. The refractive index of the alumina films increases as a function of the deposition temperature from 1.53 at 573 K to 1.61 at 813 K. Neodymium-doped films were also obtained at low pressure by liquid source injection CVD.
ISSN:0925-8388
1873-4669
DOI:10.1016/S0925-8388(98)00433-2