Wet etching of hydrogenated amorphous carbon films

Amorphous hydrogenated carbon films (a-C:H) have found many applications in microelectronics, micro-machining and sensors, as a dielectric material, structural layers, sacrificial layers and masks for etching in alkaline solutions. The possibility of deposition at low temperature (

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Bibliographic Details
Published in:Diamond and related materials 2001-03, Vol.10 (3), p.976-979
Main Authors: Jaramillo, J.M, Mansano, R.D, Zambom, L.S, Massi, M, Maciel, H.S
Format: Article
Language:English
Subjects:
Amorphous hydrogenated carbon film
Cross-disciplinary physics: materials science
rheology
Diamond-like carbon
Etching
Exact sciences and technology
Materials science
Micro-machining
Physics
Sputtering
Surface cleaning, etching, patterning
Surface treatments
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Description
Summary:Amorphous hydrogenated carbon films (a-C:H) have found many applications in microelectronics, micro-machining and sensors, as a dielectric material, structural layers, sacrificial layers and masks for etching in alkaline solutions. The possibility of deposition at low temperature (
ISSN:0925-9635
1879-0062
DOI:10.1016/S0925-9635(00)00584-7