Preparation of nitrogen-rich CNx films with inductively coupled plasma CVD and pulsed laser deposition

Saved in:
Bibliographic Details
Published in:Diamond and related materials 2001-09, Vol.10 (9-10), p.1901-1909
Main Authors: BULIR, J, DELPLANCKE-OGLETREE, M. P, LANCOK, J, JELINEK, M, POPOV, C, KLETT, A, KULISCH, W
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Laser deposition
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0925-9635
1879-0062
DOI:10.1016/S0925-9635(01)00436-8