Effect of substrate on the characteristics of the interface between diamond film and substrate

Diamond films were deposited on Si and Mo substrates by a microwave plasma-enhanced chemical vapor deposition method. The morphology and the chemical composition of the interfacial layer were investigated on the film side and the substrate side surfaces. In the Si substrate case, we found an island...

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Bibliographic Details
Published in:Diamond and related materials 1997-05, Vol.6 (8), p.959-963
Main Authors: Francois, N., Kim, S.H., Park, Y.S., Lee, J.-W., Hahn, I.T., Yun, W.S.
Format: Article
Language:English
Subjects:
Chemical vapour deposition
Condensed matter: structure, mechanical and thermal properties
Diamond films
Exact sciences and technology
Interface structure and roughness
Interface/interfacial
Physics
Solid surfaces and solid-solid interfaces
substrate
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Summary:Diamond films were deposited on Si and Mo substrates by a microwave plasma-enhanced chemical vapor deposition method. The morphology and the chemical composition of the interfacial layer were investigated on the film side and the substrate side surfaces. In the Si substrate case, we found an island shape which could involve a rough surface as well as glassy carbon areas. On the contrary, in the Mo substrate case, no such island could be observed, and the film side detached from the Mo substrate presented a much smoother surface. From these results, we suggested the model for the initial step of diamond deposition in cases of Si and Mo substrates.
ISSN:0925-9635
1879-0062
DOI:10.1016/S0925-9635(96)00774-1