Flat-flame diamond CVD: The effect of pressure and operating conditions for specific applications

The radial uniformity and scaleable nature of flat flames make them an attractive technique for diamond deposition The advantages of low-pressure operation relative to atmospheric operation are discussed with respect to reactor design, heat transfer considerations and flame stability. The thermochem...

Full description

Saved in:
Bibliographic Details
Published in:Diamond and related materials 1998-02, Vol.7 (2), p.133-138
Main Authors: Wolden, C.A., Davis, R.F., Sitar, Z., Prater, J.T.
Format: Article
Language:English
Subjects:
Boron doping
Combustion synthesis
Low temperature
Texture
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The radial uniformity and scaleable nature of flat flames make them an attractive technique for diamond deposition The advantages of low-pressure operation relative to atmospheric operation are discussed with respect to reactor design, heat transfer considerations and flame stability. The thermochemistry and kinetics of flat flames are described in regard to process optimization. Examples are provided to describe how to tailor the low-pressure process for the following applications: morphology control for the production of textured films, low-temperature deposition and the introduction of dopants.
ISSN:0925-9635
1879-0062
DOI:10.1016/S0925-9635(97)00206-9