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Ultra-high resolution electron microscopy of defects in the CVD diamond structure

An elucidation of defect core structures in diamond thin films prepared by microwave plasma-assisted chemical vapour deposition (CVD) on silicon substrates is reported. The defects have been identified by ultra-high resolution electron microscopy (UHREM) at 0.15 nm resolution and associated image ca...

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Bibliographic Details
Published in:Diamond and related materials 1998-02, Vol.7 (2), p.222-227
Main Authors: Delclos, S., Dorignac, D., Phillipp, F., Silva, F., Gicquel, A.
Format: Article
Language:English
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Summary:An elucidation of defect core structures in diamond thin films prepared by microwave plasma-assisted chemical vapour deposition (CVD) on silicon substrates is reported. The defects have been identified by ultra-high resolution electron microscopy (UHREM) at 0.15 nm resolution and associated image calculations. Three-dimensional atomic-scale models are proposed for three illustrative examples. The first two result from the interaction between a ∑ = 3 twin and (i) a perfect 60° dislocation and also (ii) a dissociated 0° dislocation. The last one (iii) consists of an original intrinsic stacking fault step. To our knowledge, it is the first time that such a type of defect has been reported. The experimental applicability of UHREM to the study of such complex defect configurations is also confirmed.
ISSN:0925-9635
1879-0062
DOI:10.1016/S0925-9635(97)00213-6