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Use of a CSLM for the analysis of chemical etched tracks in PADC
The possibility of using a confocal scanning laser microscope (CSLM) for the analysis of different parameters of α tracks in PADC was investigated. For this, PADC detectors were irradiated with α particles from an americium source under different incidence angles. The detectors were chemically etche...
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Published in: | Radiation measurements 1997, Vol.28 (1), p.845-848 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The possibility of using a confocal scanning laser microscope (CSLM) for the analysis of different parameters of α tracks in PADC was investigated. For this, PADC detectors were irradiated with α particles from an americium source under different incidence angles. The detectors were chemically etched and the analysis of the etched tracks was done with a confocal scanning laser microscope under different conditions. These include reflective mode and fluorescent mode. The reflective mode showed a very low contrast. Better image quality was obtained by filling the tracks with a fluorescent solution. The CSLM is not limited to XY-scans. By changing the focal plane, Z-scans can be obtained. Depth-profiles of chemical etched tracks can be obtained with a resolution in the order of 0.5 μm. |
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ISSN: | 1350-4487 1879-0925 |
DOI: | 10.1016/S1350-4487(97)00195-9 |