Thermal evolution of extended defects in implanted Si

Saved in:
Bibliographic Details
Published in:Materials science in semiconductor processing 2000-08, Vol.3 (4), p.269-277
Main Authors: Claverie, Alain, Colombeau, Benjamin, Ben Assayag, Gérard, Bonafos, Caroline, Cristiano, Filadelfo, Omri, Mourad, de Mauduit, Bernadette
Format: Article
Language:eng ; jpn
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:1369-8001
DOI:10.1016/S1369-8001(00)00043-3