Electroless copper deposition solution induced chemical changes in low- k fluorinated dielectrics

It is demonstrated that the electroless Cu deposition solution can lead to a significant chemical change in FLARE ™1.51, as indicated by the observed disappearance of the 1726 cm −1 absorption band from IR spectra. Two possible reaction mechanisms are suggested for the observed change in FLARE ™1.51...

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Published in:Materials science in semiconductor processing 1999-04, Vol.2 (1), p.19-22
Main Authors: Hsu, D.T., Shi, F.G., Lopatin, S., Shacham-Diamand, Y., Zhao, B., Brongo, M., Vasudev, P.K.
Format: Article
Language:English
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Summary:It is demonstrated that the electroless Cu deposition solution can lead to a significant chemical change in FLARE ™1.51, as indicated by the observed disappearance of the 1726 cm −1 absorption band from IR spectra. Two possible reaction mechanisms are suggested for the observed change in FLARE ™1.51.
ISSN:1369-8001
1873-4081
DOI:10.1016/S1369-8001(98)00052-3