Fabrication and thermal annealing behavior of nanoscale ripple fabricated by focused ion beam

The development, during annealing, of periodic one-dimensional ripple structure has been investigated. The nanoscale ripple array was fabricated on silicon(001) crystal surface using focused ion beam (FIB). Annealing was performed isothermally in a flowing argon gas ambient at 670°C. The morphology...

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Bibliographic Details
Published in:Applied surface science 2004-04, Vol.227 (1-4), p.250-254
Main Authors: Xie, D.Z., Ngoi, B.K.A., Zhou, W., Fu, Y.Q.
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Focused ion beam
Micromachining
Physics
Sputtering
Surface diffusion
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Summary:The development, during annealing, of periodic one-dimensional ripple structure has been investigated. The nanoscale ripple array was fabricated on silicon(001) crystal surface using focused ion beam (FIB). Annealing was performed isothermally in a flowing argon gas ambient at 670°C. The morphology of the ripple before and after annealing was analyzed by use of atomic force microscope. The height of the ripple decreased after thermal annealing. Furthermore, after annealing, spikes of gallium and/or gallium-rich precipitate were also observed on the surface of the ripples and the FIB milled areas.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2003.11.075