Comment to “Copper chemical vapour deposition on organosilane-treated SiO2 surfaces”: [Applied Surface Science 222 (2004) 102–109]

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Bibliographic Details
Published in:Applied surface science 2004-05, Vol.229 (1-4), p.1-1
Main Authors: Semaltianos, N.G, Pastol, J.-L, Doppelt, P
Format: Article
Language:English
Online Access:Get full text
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ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2004.04.023