Transparent high-surface-work-function Al-doped CdO electrodes obtained by rf magnetron sputtering with oxygen flow

► AlCdO films were deposited by rf magnetron sputtering with and without oxygen flow. ► For AlCdO films deposited with oxygen flow, we measure the high work function. ► For AlCdO films deposited without oxygen flow, we measure the low work function. ► It is shown the peroxidic AlCdO surface with a h...

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Bibliographic Details
Published in:Applied surface science 2012-03, Vol.258 (10), p.4632-4635
Main Authors: Cho, Wei-Min, He, Guan-Ru, Su, Ting-Hong, Lin, Yow-Jon
Format: Article
Language:English
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Optical properties
Oxide
Physics
Surfaces
Thin films
Work function
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Summary:► AlCdO films were deposited by rf magnetron sputtering with and without oxygen flow. ► For AlCdO films deposited with oxygen flow, we measure the high work function. ► For AlCdO films deposited without oxygen flow, we measure the low work function. ► It is shown the peroxidic AlCdO surface with a high work function. The surface work function of transparent conducting oxides is a critical parameter influencing device efficiency by controlling charge transport across interfaces. In this study, Al-doped CdO films were deposited on glass substrates by rf magnetron sputtering with and without oxygen flow. For Al-doped CdO films deposited with (without) oxygen flow, we measure the high (low) surface work function close to 5.4 (4.6)eV. Our results suggest a method for fabricating Al-doped CdO electrodes with large, tunable work functions that could be relevant in designing electrodes for improving the performance of optoelectronic and electronic devices.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2012.01.042