Integrated lithography to prepare periodic arrays of nano-objects

• Published in: Applied surface science 2013-08, Vol.278, p.330-335
• Main Authors: Sipos, Áron, Szalai, Anikó, Csete, Mária
• Format: Article
• Language: English
• Subjects: Complex plasmonic structures; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Integrated interference and colloid sphere lithography; Linearly and circularly polarized light; Physics
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2012.11.078

[Display omitted] ► Novel idea to integrate interference and colloid-sphere lithography. ► Finite element method used to present the capabilities of integrated lithography. ► Tuning four structure parameters independently by integrated lithography. ► Illumination of silica sphere monolayer by two interfering beams. ► Effect of wavelength, sphere diameter, orientation and polarization on near-field distribution. We present an integrated lithography method to prepare versatile nano-objects with variable shape and nano-scaled substructure, in wavelength-scaled periodic arrays with arbitrary symmetry. The idea is to illuminate colloid sphere monolayers by polarized beams possessing periodic lateral intensity modulations. Finite element method was applied to determine the effects of the wavelength, polarization and angle of incidence of the incoming beam, and to predict the characteristics of nano-objects, which can be fabricated on thin metal layer covered substrates due to the near-field enhancement under silica colloid spheres. The inter-object distance is controlled by varying the relative orientation of the periodic intensity modulation with respect to the silica colloid sphere monolayer. It is shown that illuminating silica colloid sphere monolayers by two interfering beams, linear patterns made of elliptical holes appear in case of linear polarization, while circularly polarized beams result in co-existent rounded objects, as more circular nano-holes and nano-crescents. The size of the nano-objects and their sub-structure is determined by the spheres diameter and by the wavelength. We present various complex plasmonic patterns made of versatile nano-objects that can be uniquely fabricated applying the inherent symmetry breaking possibilities in the integrated lithography method.