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Tuning size and coverage of Pd nanoparticles using atomic layer deposition
[Display omitted] •Synchrotron-based in situ GISAXS and XRF are applied during Pd plasma-enhanced ALD.•The nucleation and the evolution in Pd nanoparticle morphology is investigated.•Pre-pulses with trimethylaluminum enhance the initial coverage of Pd nanoparticles.•The role of extra O2 plasma pulse...
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Published in: | Applied surface science 2021-02, Vol.539, p.148238, Article 148238 |
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Main Authors: | , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | [Display omitted]
•Synchrotron-based in situ GISAXS and XRF are applied during Pd plasma-enhanced ALD.•The nucleation and the evolution in Pd nanoparticle morphology is investigated.•Pre-pulses with trimethylaluminum enhance the initial coverage of Pd nanoparticles.•The role of extra O2 plasma pulse, with H2 plasma as co-reactant, is investigated.•Precise control of the Pd nanoparticle dimensions and coverage is achieved.
The morphology evolution of supported palladium nanoparticles (Pd NPs) during plasma-enhanced atomic layer deposition using palladium hexafluoroacetylacetonate (Pd(hfac)2) as precursor was investigated using in situ and ex situ X-ray fluorescence (XRF) and grazing incidence small angle X-ray scattering (GISAXS), as well as ex situ scanning electron microscopy (SEM). The initial areal density of Pd NPs increases through adding cycles of the three-step process using Pd(hfac)2, H2 plasma and trimethylaluminum (TMA) prior to the standard Pd(hfac)2 + H2 plasma process. The participation of an O2 plasma exposure as additional co-reactant before or after the H2 plasma step also plays a role in the nucleation density and particle coalescence, affecting also the shape of the deposited particles. Based on the gathered knowledge, a synthetic approach that enables precise control of the Pd nanoparticle dimensions and coverage is developed. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2020.148238 |