Chemical reaction on silicon carbide wafer (0 0 0 1 and 0 0 0 −1) with water molecules in nanoscale polishing

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Bibliographic Details
Published in:Applied surface science 2023-01, Vol.607, p.155090, Article 155090
Main Authors: Tian, Zige, Lu, Jing, Luo, Qiufa, Xu, Xipeng
Format: Article
Language:English
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ISSN:0169-4332
DOI:10.1016/j.apsusc.2022.155090