Active screen plasma nitriding of a Si-alloyed FeCrNi medium entropy alloy: High interstitial absorption and an anomalous Si-induced decomposition mechanism in N-expanded austenite

[Display omitted] •After ASPN, in contrast to 316 SS, the high N absorption on MEA is attributable to the equimolar Cr content.•Early ∼3–8 nm dotted Si-rich nanoprecipitates at 430 °C and ∼5–30 nm spheroidal ones at 480 °C.•Nanoprecipitation-modified γN without reducing corrosion resistance at...

Full description

Saved in:
Bibliographic Details
Published in:Applied surface science 2023-07, Vol.624, p.157137, Article 157137
Main Authors: Tao, Xiao, Yang, Yepeng, Qi, Jiahui, Cai, Biao, Rainforth, W.M., Li, Xiaoying, Dong, Hanshan
Format: Article
Language:English
Subjects:
Expanded austenite
Medium entropy alloys
Microstructure
Plasma nitriding
Surface alloying
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:[Display omitted] •After ASPN, in contrast to 316 SS, the high N absorption on MEA is attributable to the equimolar Cr content.•Early ∼3–8 nm dotted Si-rich nanoprecipitates at 430 °C and ∼5–30 nm spheroidal ones at 480 °C.•Nanoprecipitation-modified γN without reducing corrosion resistance at
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2023.157137