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Angular distribution of species in pulsed electron beam deposition of BaxSr1-xTiO3

[Display omitted] •Angular thickness and composition profiles of BaxSr1-xTiO3 (x = 0.2) thin films in PED.•Forward shaped peaks in PED like in PLD for film thickness profiles.•Measurable thickness up to 80-90° for major axis and 25° for minor axis.•The film composition depends on the element and bac...

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Published in:Applied surface science 2024-06, Vol.657, p.159757, Article 159757
Main Authors: Dobrin, D., Burducea, I., Iancu, D., Burducea, C., Gherendi, F., Nistor, M.
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container_title Applied surface science
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Burducea, I.
Iancu, D.
Burducea, C.
Gherendi, F.
Nistor, M.
description [Display omitted] •Angular thickness and composition profiles of BaxSr1-xTiO3 (x = 0.2) thin films in PED.•Forward shaped peaks in PED like in PLD for film thickness profiles.•Measurable thickness up to 80-90° for major axis and 25° for minor axis.•The film composition depends on the element and background gas used. The angular thickness and composition profiles of thin films obtained by irradiating a BaxSr1-xTiO3 (x = 0.2) target with a pulsed electron beam were investigated by Rutherford backscattering spectrometry for argon and oxygen background gases at a pressure of about 10-2 mbar. A “semi-sphere” holder was used, resulting in a fixed target to substrate distance of about 40 mm. The film thickness profiles have forward shaped peaks, with measurable thickness up to 80-90° for major axis and 25° for minor axis, and presents similar trend for both argon and oxygen background gas. The analysis of the congruent transfer of the elements from the target as a function of the angle showed that the film composition is not uniform over this wide angular range and differs with respect of the ablated target depending on the element used and on background gas.
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The angular thickness and composition profiles of thin films obtained by irradiating a BaxSr1-xTiO3 (x = 0.2) target with a pulsed electron beam were investigated by Rutherford backscattering spectrometry for argon and oxygen background gases at a pressure of about 10-2 mbar. A “semi-sphere” holder was used, resulting in a fixed target to substrate distance of about 40 mm. The film thickness profiles have forward shaped peaks, with measurable thickness up to 80-90° for major axis and 25° for minor axis, and presents similar trend for both argon and oxygen background gas. 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The angular thickness and composition profiles of thin films obtained by irradiating a BaxSr1-xTiO3 (x = 0.2) target with a pulsed electron beam were investigated by Rutherford backscattering spectrometry for argon and oxygen background gases at a pressure of about 10-2 mbar. A “semi-sphere” holder was used, resulting in a fixed target to substrate distance of about 40 mm. The film thickness profiles have forward shaped peaks, with measurable thickness up to 80-90° for major axis and 25° for minor axis, and presents similar trend for both argon and oxygen background gas. 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The angular thickness and composition profiles of thin films obtained by irradiating a BaxSr1-xTiO3 (x = 0.2) target with a pulsed electron beam were investigated by Rutherford backscattering spectrometry for argon and oxygen background gases at a pressure of about 10-2 mbar. A “semi-sphere” holder was used, resulting in a fixed target to substrate distance of about 40 mm. The film thickness profiles have forward shaped peaks, with measurable thickness up to 80-90° for major axis and 25° for minor axis, and presents similar trend for both argon and oxygen background gas. The analysis of the congruent transfer of the elements from the target as a function of the angle showed that the film composition is not uniform over this wide angular range and differs with respect of the ablated target depending on the element used and on background gas.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2024.159757</doi></addata></record>
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subjects Angular distribution
Congruent transfer
Oxides
Pulsed electron deposition
Stoichiometric
title Angular distribution of species in pulsed electron beam deposition of BaxSr1-xTiO3
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