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Bipyridinium derivative-based coordination polymers: From synthesis to materials applications
[Display omitted] •Recent bipyridinium-based coordination polymers (CPs) are reviewed.•The advantages of bipyridinium ligands for CPs synthesized are discussed.•The bipyridinium-based CPs for materials applications are highlighted. The past decade has witnessed the rapid development of functional co...
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Published in: | Coordination chemistry reviews 2019-01, Vol.378, p.533-560 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | [Display omitted]
•Recent bipyridinium-based coordination polymers (CPs) are reviewed.•The advantages of bipyridinium ligands for CPs synthesized are discussed.•The bipyridinium-based CPs for materials applications are highlighted.
The past decade has witnessed the rapid development of functional coordination polymers (CPs) for various potential applications. Generally speaking, functionalization of coordination framework to enhance materials performance could be achieved either during the framework formation or by post-synthesis modification. In spite of great progress over the past few years, there is still growing demand in expanding the research by introducing new structure motifs, among which the incorporation of stimuli-responsive ligand into the coordination skeleton is an option. In particular, the fusion of typically charged units, e.g. bipyridinium derivatives with metal ions to fabricate CPs has attracted tremendous attention. The electrostatic interaction, electron-deficient characteristic and photoelectrochemical activity make this family of materials show a wide variety of intriguing applications including smart chromic response, switching, sensing, adsorption and separation, and molecular magnets, etc. This review aims to highlight the recent progress in this area, and seek to uncover promising ideas that will stimulate future advancements at both the basic and applied levels. |
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ISSN: | 0010-8545 1873-3840 |
DOI: | 10.1016/j.ccr.2017.10.029 |