Nanoindentation and nanoscratch studies of submicron nanostructured Ti/TiCrN bilayer films deposited by RF-DC co-sputtering method

In this study, submicron nanocrystalline TiCrN films (141 nm, ± 8 nm) are deposited on titanium-coated steel substrates, maintained at a temperature of 300 °C. The bilayer films are prepared via an RF-DC co-sputtering system under different nitrogen flow rates (7, 10, 15, and 18 sccm). The compositi...

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Bibliographic Details
Published in:Ceramics international 2018-12, Vol.44 (17), p.21825-21834
Main Authors: Kosari Mehr, Ali, Zamani Meymian, Mohammad Reza, Kosari Mehr, Abbas
Format: Article
Language:English
Subjects:
Cube Corner nanohardness
Nanoscratch
RF-DC co-sputtering
Ti/TiCrN
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Summary:In this study, submicron nanocrystalline TiCrN films (141 nm, ± 8 nm) are deposited on titanium-coated steel substrates, maintained at a temperature of 300 °C. The bilayer films are prepared via an RF-DC co-sputtering system under different nitrogen flow rates (7, 10, 15, and 18 sccm). The compositional, nanostructural, mechanical, and morphological properties of the bilayer films are characterized by energy-dispersive X-ray spectroscopy (EDS), grazing incidence X-ray spectroscopy (GIXRD), backscattered scanning electron microscopy (BSE), nanoindentation and nanoscratch tests, and atomic force microscopy (AFM). The EDS results reveal that the chemical composition of the top layers is Ti1Cr1+XN with −0.06 
ISSN:0272-8842
1873-3956
DOI:10.1016/j.ceramint.2018.08.288