Electrochemical resonance: Frequency response analysis of the electrodissolution of copper in trifluoroacetic acid close to dynamic instabilities

Resonance during the electrodissolution of Cu in TFA under the influence of a potential perturbation of variable frequency. In the present work the frequency response of the electrochemical interface is investigated during the electrodissolution of copper in trifluoroacetic acid (TFA). The instabili...

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Bibliographic Details
Published in:Chemical physics letters 2010-04, Vol.490 (1), p.69-71
Main Authors: Karantonis, A., Bourbos, E., Koutsaftis, D.
Format: Article
Language:English
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Summary:Resonance during the electrodissolution of Cu in TFA under the influence of a potential perturbation of variable frequency. In the present work the frequency response of the electrochemical interface is investigated during the electrodissolution of copper in trifluoroacetic acid (TFA). The instability of a stable steady state to periodic oscillations is characterized and thus the nature of the steady state close to the instability is revealed to be a stable focus. The frequency response of the stable focus is explored by electrochemical impedance spectroscopy and the impedance amplitude profile (ZAP) method. It is shown that the system resonates at a specific frequency of the input signal and thus acts as a resonator (band-pass filter) similarly to neural resonators.
ISSN:0009-2614
1873-4448
DOI:10.1016/j.cplett.2010.03.024