Effects of deposition gas pressure on the properties of hydrogenated amorphous carbon nitride films grown by surface wave microwave plasma chemical vapor deposition

Saved in:
Bibliographic Details
Published in:Diamond and related materials 2005-03, Vol.14 (3-7), p.975-982
Main Authors: RUSOP, M, OMER, A. M. M, ADHIKARI, S, ADHIKARY, S, UCHIDA, H, SOGA, T, JIMBO, T, UMENO, M
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Conductivity of specific materials
Cross-disciplinary physics: materials science
rheology
Disordered solids
Electronic transport in condensed matter
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2004.12.040