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Polymethylmethacrylate (PMMA) deposition and removal optimization in CVD-grown graphene transfer: A Taguchi technique study
The conventional method of graphene transfer involving Polymethylmethacrylate (PMMA) often results in residual PMMA, negatively impacting the optical and electrical properties of the transferred graphene layer. This study employs the Taguchi optimization technique to minimize PMMA contamination duri...
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Published in: | Diamond and related materials 2024-11, Vol.149, p.111660, Article 111660 |
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creator | Abdelaal, Ahmed F. Laoui, Tahar Ibrahim, Ahmed Asafa, Tesleem B. Salhi, Billel Bhuiyan, Shariful Islam |
description | The conventional method of graphene transfer involving Polymethylmethacrylate (PMMA) often results in residual PMMA, negatively impacting the optical and electrical properties of the transferred graphene layer. This study employs the Taguchi optimization technique to minimize PMMA contamination during the graphene transfer process. The quality of the transferred graphene layer was evaluated utilizing atomic force microscopy (AFM), Raman spectroscopy, and Hall Effect measurement. The optimized conditions identified were a PMMA concentration (P) of 4.5 %, a spin rotation (S) speed of 3000 rpm, an acetone bath temperature (A) at 40 °C, and a dissolution duration (T) of 60 min. These parameters achieved a promising surface coverage of 3.42 %. Interestingly, further characterization highlighted that sample #8, prepared with different parameters (P = 12 %, S = 3000 rpm, A = 24 °C, T = 60 min), exhibited a surface coverage of 5.10 % and superior properties, including high transparency, exceptional film quality, low electrical resistance (8691 Ω), and an ID/IG ratio of 0.13. These findings suggest that the optimized conditions are suitable for applications prioritizing surface coverage, while the parameters for sample #8 are recommended for achieving minimal electrical resistance, high transparency, and superior film quality. This research contributes insights into PMMA-assisted graphene transfer, offering practical guidance for tailored processes.
[Display omitted]
•Optimized graphene transfer minimizes PMMA residue and boosts graphene layer performance.•Achieved enhanced optical and electrical properties in graphene layers, surpassing unoptimized samples.•Reduced PMMA residues with a surface coverage of 3.42 % using optimized transfer parameters.•Provided practical guidelines for achieving high-quality PMMA-assisted graphene transfer. |
doi_str_mv | 10.1016/j.diamond.2024.111660 |
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[Display omitted]
•Optimized graphene transfer minimizes PMMA residue and boosts graphene layer performance.•Achieved enhanced optical and electrical properties in graphene layers, surpassing unoptimized samples.•Reduced PMMA residues with a surface coverage of 3.42 % using optimized transfer parameters.•Provided practical guidelines for achieving high-quality PMMA-assisted graphene transfer.</description><identifier>ISSN: 0925-9635</identifier><identifier>DOI: 10.1016/j.diamond.2024.111660</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Chemical vapor deposition ; Electrical properties ; Graphene transfer ; PMMA ; Taguchi method</subject><ispartof>Diamond and related materials, 2024-11, Vol.149, p.111660, Article 111660</ispartof><rights>2024 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c187t-5bb3c08f2039eb3005805c1d49635347a089856807da754080b1460a45b06bf63</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Abdelaal, Ahmed F.</creatorcontrib><creatorcontrib>Laoui, Tahar</creatorcontrib><creatorcontrib>Ibrahim, Ahmed</creatorcontrib><creatorcontrib>Asafa, Tesleem B.</creatorcontrib><creatorcontrib>Salhi, Billel</creatorcontrib><creatorcontrib>Bhuiyan, Shariful Islam</creatorcontrib><title>Polymethylmethacrylate (PMMA) deposition and removal optimization in CVD-grown graphene transfer: A Taguchi technique study</title><title>Diamond and related materials</title><description>The conventional method of graphene transfer involving Polymethylmethacrylate (PMMA) often results in residual PMMA, negatively impacting the optical and electrical properties of the transferred graphene layer. This study employs the Taguchi optimization technique to minimize PMMA contamination during the graphene transfer process. The quality of the transferred graphene layer was evaluated utilizing atomic force microscopy (AFM), Raman spectroscopy, and Hall Effect measurement. The optimized conditions identified were a PMMA concentration (P) of 4.5 %, a spin rotation (S) speed of 3000 rpm, an acetone bath temperature (A) at 40 °C, and a dissolution duration (T) of 60 min. These parameters achieved a promising surface coverage of 3.42 %. Interestingly, further characterization highlighted that sample #8, prepared with different parameters (P = 12 %, S = 3000 rpm, A = 24 °C, T = 60 min), exhibited a surface coverage of 5.10 % and superior properties, including high transparency, exceptional film quality, low electrical resistance (8691 Ω), and an ID/IG ratio of 0.13. These findings suggest that the optimized conditions are suitable for applications prioritizing surface coverage, while the parameters for sample #8 are recommended for achieving minimal electrical resistance, high transparency, and superior film quality. This research contributes insights into PMMA-assisted graphene transfer, offering practical guidance for tailored processes.
[Display omitted]
•Optimized graphene transfer minimizes PMMA residue and boosts graphene layer performance.•Achieved enhanced optical and electrical properties in graphene layers, surpassing unoptimized samples.•Reduced PMMA residues with a surface coverage of 3.42 % using optimized transfer parameters.•Provided practical guidelines for achieving high-quality PMMA-assisted graphene transfer.</description><subject>Chemical vapor deposition</subject><subject>Electrical properties</subject><subject>Graphene transfer</subject><subject>PMMA</subject><subject>Taguchi method</subject><issn>0925-9635</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNqFkD9PwzAUxDOARCl8BCSPMKQ8J3GasKCq_JVa0aGwWo790rpK7GK7RYEvT0u7s7wbnu5094uiKwoDCjS_XQ2UFq01apBAkg0opXkOJ1EPyoTFZZ6ys-jc-xUATcqM9qKfmW26FsOya_ZXSNc1IiC5nk2noxuicG29DtoaIowiDlu7FQ2x66Bb_S3-HtqQ8cdDvHD2y5CFE-slGiTBCeNrdHdkROZisZFLTQLKpdGfGyQ-bFR3EZ3WovF4edR-9P70OB-_xJO359fxaBJLWgxDzKoqlVDUCaQlVikAK4BJqrL9nDQbCijKguUFDJUYsgwKqGiWg8hYBXlV52k_Yodc6az3Dmu-droVruMU-J4aX_EjNb6nxg_Udr77gw935bYaHfdSo5GotEMZuLL6n4RflKp7bg</recordid><startdate>202411</startdate><enddate>202411</enddate><creator>Abdelaal, Ahmed F.</creator><creator>Laoui, Tahar</creator><creator>Ibrahim, Ahmed</creator><creator>Asafa, Tesleem B.</creator><creator>Salhi, Billel</creator><creator>Bhuiyan, Shariful Islam</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>202411</creationdate><title>Polymethylmethacrylate (PMMA) deposition and removal optimization in CVD-grown graphene transfer: A Taguchi technique study</title><author>Abdelaal, Ahmed F. ; Laoui, Tahar ; Ibrahim, Ahmed ; Asafa, Tesleem B. ; Salhi, Billel ; Bhuiyan, Shariful Islam</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c187t-5bb3c08f2039eb3005805c1d49635347a089856807da754080b1460a45b06bf63</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Chemical vapor deposition</topic><topic>Electrical properties</topic><topic>Graphene transfer</topic><topic>PMMA</topic><topic>Taguchi method</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Abdelaal, Ahmed F.</creatorcontrib><creatorcontrib>Laoui, Tahar</creatorcontrib><creatorcontrib>Ibrahim, Ahmed</creatorcontrib><creatorcontrib>Asafa, Tesleem B.</creatorcontrib><creatorcontrib>Salhi, Billel</creatorcontrib><creatorcontrib>Bhuiyan, Shariful Islam</creatorcontrib><collection>CrossRef</collection><jtitle>Diamond and related materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Abdelaal, Ahmed F.</au><au>Laoui, Tahar</au><au>Ibrahim, Ahmed</au><au>Asafa, Tesleem B.</au><au>Salhi, Billel</au><au>Bhuiyan, Shariful Islam</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Polymethylmethacrylate (PMMA) deposition and removal optimization in CVD-grown graphene transfer: A Taguchi technique study</atitle><jtitle>Diamond and related materials</jtitle><date>2024-11</date><risdate>2024</risdate><volume>149</volume><spage>111660</spage><pages>111660-</pages><artnum>111660</artnum><issn>0925-9635</issn><abstract>The conventional method of graphene transfer involving Polymethylmethacrylate (PMMA) often results in residual PMMA, negatively impacting the optical and electrical properties of the transferred graphene layer. This study employs the Taguchi optimization technique to minimize PMMA contamination during the graphene transfer process. The quality of the transferred graphene layer was evaluated utilizing atomic force microscopy (AFM), Raman spectroscopy, and Hall Effect measurement. The optimized conditions identified were a PMMA concentration (P) of 4.5 %, a spin rotation (S) speed of 3000 rpm, an acetone bath temperature (A) at 40 °C, and a dissolution duration (T) of 60 min. These parameters achieved a promising surface coverage of 3.42 %. Interestingly, further characterization highlighted that sample #8, prepared with different parameters (P = 12 %, S = 3000 rpm, A = 24 °C, T = 60 min), exhibited a surface coverage of 5.10 % and superior properties, including high transparency, exceptional film quality, low electrical resistance (8691 Ω), and an ID/IG ratio of 0.13. These findings suggest that the optimized conditions are suitable for applications prioritizing surface coverage, while the parameters for sample #8 are recommended for achieving minimal electrical resistance, high transparency, and superior film quality. This research contributes insights into PMMA-assisted graphene transfer, offering practical guidance for tailored processes.
[Display omitted]
•Optimized graphene transfer minimizes PMMA residue and boosts graphene layer performance.•Achieved enhanced optical and electrical properties in graphene layers, surpassing unoptimized samples.•Reduced PMMA residues with a surface coverage of 3.42 % using optimized transfer parameters.•Provided practical guidelines for achieving high-quality PMMA-assisted graphene transfer.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.diamond.2024.111660</doi></addata></record> |
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subjects | Chemical vapor deposition Electrical properties Graphene transfer PMMA Taguchi method |
title | Polymethylmethacrylate (PMMA) deposition and removal optimization in CVD-grown graphene transfer: A Taguchi technique study |
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