Characterization of the anodic growth and dissolution of oxide films on valve metals

Chemical dissolution processes coupled to anodic oxide growth taking place by a “high-field” conduction mechanism, are considered. The equation for the steady-state current density obtained during potentiodynamic polarization measurements is derived and the effect of the oxide dissolution rate on th...

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Bibliographic Details
Published in:Electrochemistry communications 2008-03, Vol.10 (3), p.433-437
Main Authors: Linarez Pérez, Omar E., Fuertes, Valeria C., Pérez, Manuel A., López Teijelo, Manuel
Format: Article
Language:English
Subjects:
Applied sciences
Corrosion
Corrosion mechanisms
Exact sciences and technology
High-field growth
Metals. Metallurgy
Oxides dissolution
Oxides growth
Simulation
Valve metals
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Summary:Chemical dissolution processes coupled to anodic oxide growth taking place by a “high-field” conduction mechanism, are considered. The equation for the steady-state current density obtained during potentiodynamic polarization measurements is derived and the effect of the oxide dissolution rate on the overall potentiodynamic behaviour by applying repetitive scans with either fixed or increasing anodic switching potentials is discussed. The procedure for obtaining the current dissolution as well as the parameters that characterize the high-field growth is discussed.
ISSN:1388-2481
1873-1902
DOI:10.1016/j.elecom.2008.01.002